The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2024

Filed:

May. 04, 2021
Applicant:

Omnivision Technologies, Inc., Santa Clara, CA (US);

Inventors:

Yuanliang Liu, San Jose, CA (US);

Hui Zang, San Jose, CA (US);

Assignee:

OMNIVISION TECHNOLOGIES, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/146 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1463 (2013.01); H01L 27/14612 (2013.01); H01L 27/14632 (2013.01); H01L 27/14687 (2013.01);
Abstract

Process to release Silicon stress in forming CMOS image sensor. In one embodiment, a method for manufacturing an image sensor includes providing a first wafer that is a semiconductor substrate, where the first wafer has a first side and a second side opposite from the first side. The method also includes attaching a second wafer to the second side of the first wafer. The method further includes forming isolation structures in the second wafer by etching. The isolation structures are bounded by the second side of the first wafer. The method also includes growing an epitaxial layer between individual isolation structures.


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