The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2024

Filed:

Mar. 19, 2021
Applicants:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Samsung Sdi Co., Ltd., Yongin-si, KR;

Inventors:

Shang Hyeun Park, Yongin-si, KR;

Hojeong Paek, Suwon-si, KR;

Eun Joo Jang, Suwon-si, KR;

Shin Ae Jun, Seongnam-si, KR;

Assignees:

SAMSUNG ELECTRONICS CO., LTD., Gyeonggi-do, KR;

SAMSUNG SDI CO, LTD., Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); C08F 220/14 (2006.01); C09D 4/06 (2006.01); C09K 11/02 (2006.01); C09K 11/70 (2006.01); G02B 5/20 (2006.01); G02B 5/22 (2006.01); G03F 7/004 (2006.01); G03F 7/033 (2006.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G03F 7/0007 (2013.01); C08F 220/14 (2013.01); C09D 4/06 (2013.01); C09K 11/02 (2013.01); C09K 11/703 (2013.01); G02B 5/207 (2013.01); G02B 5/223 (2013.01); G03F 7/004 (2013.01); G03F 7/0042 (2013.01); G03F 7/0047 (2013.01); G03F 7/033 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01);
Abstract

A photosensitive composition including a quantum dot dispersion, a reactive compound having at least two thiol groups, a photopolymerizable monomer having a carbon-carbon double bond, and a photoinitiator, wherein the quantum dot dispersion includes a carboxylic acid group-containing polymer and a quantum dot dispersed in the carboxylic acid group containing polymer, and wherein the carboxylic acid group-containing polymer includes a copolymer of a monomer combination including a first monomer having a carboxylic acid group and a carbon-carbon double bond and a second monomer having a carbon-carbon double bond and a hydrophobic moiety and not having a carboxylic acid group.


Find Patent Forward Citations

Loading…