The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2024
Filed:
Feb. 19, 2022
Applicant:
Subcom, Llc, Eatontown, NJ (US);
Inventors:
Marsha Ann Spalding, Hampton, NJ (US);
Ralph J. Rue, Barnegat, NJ (US);
Assignee:
SubCom, LLC, Eatontown, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/44 (2006.01); H04B 10/25 (2013.01);
U.S. Cl.
CPC ...
G02B 6/44384 (2023.05); H04B 10/25 (2013.01);
Abstract
Disclosed are approaches for forming a semiconductor device. In some embodiments, a method may include providing a patterned hardmask over a substrate, and providing, from an ion source, a plasma treatment to a first section of the patterned hardmask, wherein a second section of the patterned hardmask does not receive the plasma treatment. The method may further include etching the substrate to form a plurality of fins in the substrate, wherein the first section of the patterned hardmask is etched faster than the second section of the patterned hardmask.