The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2024

Filed:

Apr. 08, 2019
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Kenichiro Yamada, Tokyo, JP;

Shinsuke Onoe, Tokyo, JP;

Makoto Hosaka, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/956 (2006.01); G01B 11/25 (2006.01);
U.S. Cl.
CPC ...
G01N 21/956 (2013.01); G01B 11/2518 (2013.01);
Abstract

A surface shape detection device using differential interference optics achieves restoration error reduction of a surface shape while maintaining resolution. The surface shape detection device includes: a light spot scanning unit such as a wafer rotation direction drive unit that scans a wafer surface with a light spot; an interference light detection mechanism such as a differential interference optical system that detects interference light of light obtained by scanning a surface of an inspection target with a plurality of the light spots separated by a predetermined design distance; and a surface shape restoration processing unit such as a wafer surface shape restoration unit that samples, at a predetermined quantization time interval, and calculates information of the interference light, and performs restoration processing on a surface shape of the wafer, in which the predetermined design distance is larger than a quantization distance interval corresponding to the predetermined quantization time interval.


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