The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2024

Filed:

Mar. 12, 2021
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Namseop Kwon, Suwon-si, KR;

Jangwoo You, Seoul, KR;

Minkyung Lee, Suwon-si, KR;

Byunghoon Na, Suwon-si, KR;

Seunghoon Han, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/25 (2006.01); F21V 5/04 (2006.01); F21V 11/08 (2006.01); F21V 13/02 (2006.01); G01B 11/22 (2006.01);
U.S. Cl.
CPC ...
G01B 11/2513 (2013.01); F21V 5/045 (2013.01); F21V 11/08 (2013.01); F21V 13/02 (2013.01); G01B 11/22 (2013.01);
Abstract

A structured light projectors includes an illuminator configured to emit illumination light, a pattern mask configured to project structured light by partially transmitting the illumination light, and a lens configured to project the structured light, wherein the pattern mask includes a first lens distortion compensation region including a plurality of opaque first light shielding patterns having a first pattern width, respectively, and a second lens distortion compensation region surrounding the first lens distortion compensation region, the second lens distortion compensation region including a plurality of opaque second light shielding patterns having a second pattern width, respectively, wherein the second pattern width is less than the first pattern width.


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