The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2024
Filed:
Aug. 24, 2018
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventor:
Kwang Seung Park, Daejeon, KR;
Assignee:
LG Chem, Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C01B 33/12 (2006.01);
U.S. Cl.
CPC ...
C01B 33/12 (2013.01);
Abstract
The present application relates to a method for producing a silica film, which includes a step of contacting a silica precursor layer formed of a silica precursor composition having a pH of 5 or less with a Lewis base, where the silica precursor composition includes a silica precursor formed from a silane compound and an acid catalyst. The present application can provide a method capable of forming a silica film having excellent resistance to a vertical load and a tangential load without going through expensive equipment or a high temperature process.