The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2024
Filed:
Oct. 26, 2022
Applicant:
Advanced Energy Industries, Inc., Denver, CO (US);
Inventor:
Gideon Van Zyl, Fort Collins, CO (US);
Assignee:
Advanced Energy Industries, Inc., Denver, CO (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H03H 7/01 (2006.01); H03H 7/38 (2006.01); H05H 1/46 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32183 (2013.01); H01J 37/32128 (2013.01); H01J 37/32165 (2013.01); H03H 7/0138 (2013.01); H03H 7/38 (2013.01); H05H 1/46 (2013.01); H01J 2237/24585 (2013.01); H05H 2242/26 (2021.05);
Abstract
Plasma processing systems and methods are disclosed. The plasma processing system includes a high-frequency generator configured to deliver power to a plasma chamber and a low-frequency generator configured to deliver power to the plasma chamber. A filter is coupled between the plasma chamber and the high-frequency generator, and the filter suppresses mixing products of high frequencies produced by the high-frequency generator and low frequencies produced by the low-frequency generator.