The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2024
Filed:
Dec. 05, 2022
Applicant:
Purdue Research Foundation, West Lafayette, IN (US);
Inventors:
Urcan Guler, Avon, CT (US);
Alexander Kildishev, West Lafayette, IN (US);
Vladimir M. Shalaev, West Lafayette, IN (US);
Alexei S. Lagutchev, West Lafayette, IN (US);
Andrey N. Smolyaninov, Chimki, RU;
Assignee:
Purdue Research Foundation, West Lafayette, IN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/122 (2006.01); B82Y 20/00 (2011.01);
U.S. Cl.
CPC ...
G02B 6/1226 (2013.01); B82Y 20/00 (2013.01); Y10S 977/701 (2013.01); Y10S 977/949 (2013.01); Y10S 977/95 (2013.01);
Abstract
A method for producing a single photon source includes lithographically patterning a polymer on top of a plasmonic thin film, functionalizing top surfaces of the plasmonic thin film and the polymer, removing the polymer to form patterned functionalized sites on the top surface of the plasmonic thin film surface, and depositing nanodiamond particles to the patterned functionalized sites.