The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2024

Filed:

Jun. 13, 2019
Applicant:

Endress+hauser Se+co. KG, Maulburg, DE;

Inventors:

Martin Hitzler, Dillingen, DE;

Winfried Mayer, Buch, DE;

Assignee:

Endress+Hauser SE+Co. KG, Maulburg, DE;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 1/22 (2006.01); G01F 23/284 (2006.01); G01S 7/03 (2006.01); G01S 13/88 (2006.01);
U.S. Cl.
CPC ...
G01S 7/032 (2013.01); G01F 23/284 (2013.01); H01Q 1/225 (2013.01); H01Q 1/2283 (2013.01); G01S 13/88 (2013.01);
Abstract

Disclosed is a high frequency module for producing or processing radar signals for use in radar-based fill-level measuring devices. The high frequency module includes: a semiconductor component to produce or to process electrical, high frequency signals; a dielectric coupling element contacted with the semiconductor component to couple the high frequency signals as radar signals into a dielectric waveguide or in order to couple radar signals from the waveguide as electrical, high frequency signals into the semiconductor component. The coupling element and the waveguide form a plug contact. In the case of appropriate design of the plug contact there results upon plug-in a self-centering, so that need for a complex adjustment during manufacturing is absent. Since radar frequencies of above 100 GHz can be produced by the semiconductor component, corresponding fill level measuring devices are characterized by a high measuring resolution and compact structures.


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