The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2024
Filed:
Jan. 24, 2020
Teijin Aramid B.v., Arnhem, NL;
Ruben Calis, Pannerden, NL;
Dennis Wilbers, Arnhem, NL;
TEIJIN ARAMID B.V., Arnhem, NL;
Abstract
A process for manufacturing a ballistic resistant article including steps: a) stacking a stretchable lamina of ultra-high molecular weight polyethylene (UHMWPE) and a stretchable continuous film of a polymer as organic matrix material to form a lamina-film stack, the continuous film not being an UHMWPE film; b) elongating the stack at a temperature below the melting point of the lamina, to an elongation ratio of at least 2, thereby providing a UHMWPE film with an organic matrix material in which the UHMWPE film is co-stretched with the film of polymer as organic matrix material; c) aligning a plurality of films to form a layer of films; d) stacking at least two layers of films to form a sheet; e) stacking a plurality of sheets to form a stack of sheets, and consolidating the sheets prior to and/or after step e) by applying pressure and optionally heat. Also, a ballistic-resistant article.