The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2024
Filed:
Jan. 15, 2020
Ionautics Ab, Öjebyn, SE;
Henrik Pedersen, Stigtomta, SE;
Hama Nadhom, Linköping, SE;
Ionautics AB, Öjebyn, SE;
Abstract
The present disclosure relates to a method for chemical vapour deposition on a substrate, the method comprising a precursor step and a reactant step, wherein the precursor step comprises chemisorbing a layer of precursor molecules on the substrate (), and wherein the reactant step comprises adding to at least part of the substrate () surface species able to reduce the precursor molecule, whereby at least a part of the reduced precursor molecule is deposited on the substrate () surface, characterized by applying by means of a voltage source () a positive bias to at least part of the substrate () surface during at least part of the reactant step, wherein the step of adding the reducing species comprises providing by means of an electron source () electrons as free particles, whereby during the reactant step a closed electrical circuit is formed as the free electrons are transmitted to the substrate (170) surface.