The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2024
Filed:
Jun. 19, 2020
Applicant:
Basf SE, Ludwigshafen am Rhein, DE;
Inventors:
Francisco Javier Lopez Villanueva, Ludwigshafen, DE;
Yeni Burk, Ludwigshafen, DE;
Daniel Loeffler, Ludwigshafen, DE;
Jan Ole Mueller, Ludwigshafen, DE;
Marcel Brill, Ludwigshafen, DE;
Patrick Wilke, Ludwigshafen, DE;
Jean-Pierre Berkan Lindner, Ludwigshafen, DE;
Volodymyr Boyko, Ludwigshafen, DE;
Assignee:
BASF SE, Ludwigshafen am Rhein, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/08 (2006.01); C09K 13/00 (2006.01); H01L 21/306 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
C09K 13/08 (2013.01); C09K 13/00 (2013.01); H01L 21/30604 (2013.01); H01L 21/31111 (2013.01); H01L 21/32134 (2013.01);
Abstract
Described herein is a composition for selectively etching a layer including a silicon germanium alloy (SiGe) in the presence of a silicon-containing layer, particularly a layer comprising a-Si, SiOx, SiON, SiN, or a combination thereof, the composition including: