The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2024

Filed:

Mar. 02, 2020
Applicant:

Kabushiki Kaisha Toshiba, Minato-ku, JP;

Inventors:

Yuki Watanabe, Kashiwazaki, JP;

Dai Yamamoto, Kashiwazaki, JP;

Toshitada Nakazawa, Kashiwazaki, JP;

Tetsuro Kano, Kashiwazaki, JP;

Masanori Tanaka, Kashiwazaki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01M 4/62 (2006.01); H01M 4/02 (2006.01); H01M 4/04 (2006.01); H01M 4/1391 (2010.01); H01M 4/36 (2006.01); H01M 4/505 (2010.01); H01M 4/525 (2010.01); H01M 10/0525 (2010.01);
U.S. Cl.
CPC ...
H01M 4/625 (2013.01); H01M 4/0404 (2013.01); H01M 4/1391 (2013.01); H01M 4/364 (2013.01); H01M 4/505 (2013.01); H01M 4/525 (2013.01); H01M 10/0525 (2013.01); H01M 2004/021 (2013.01); H01M 2004/027 (2013.01); H01M 2004/028 (2013.01);
Abstract

An electrode according to an embodiment contains an electrode mixture layer containing an active material and a conductive assistant. In a logarithmic differential pore volume distribution by a mercury intrusion method, the electrode mixture layer satisfies: a ratio P/Pwithin a range of 2 or more and less than 8, and a ratio S/Swithin a range of 3 or more and less than 10. Pis a value of a maximum logarithmic differential pore volume in a pore diameter range of 0.1 μm or more and 1 μm or less. Pis a value of a logarithmic differential pore volume of a pore diameter of 0.03 μm. Sis an integrated value in a pore diameter range of 0.1 μm or more and 1 μm or less. Sis an integrated value in a pore diameter range of more than 0 μm and less than 0.1 μm.


Find Patent Forward Citations

Loading…