The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2024
Filed:
Jun. 28, 2021
Wonik Ips Co., Ltd., Pyeongtaek-si, KR;
Su In Kim, Pyeongtaek-si, KR;
Young Chul Choi, Hwaseong-si, KR;
Chang Hak Shin, Pyeongtaek-si, KR;
Min Woo Park, Osan-si, KR;
Ji Hyun Kim, Uijeongbu-si, KR;
Kyung Mi Kim, Osan-si, KR;
WONIK IPS CO., LTD., Pyeongtaek-si, KR;
Abstract
Provided are a method of depositing a thin film and a method of manufacturing a semiconductor device using the same, and the method of depositing a thin film uses a substrate processing apparatus including a chamber, a substrate support on which a substrate is mounted, a gas supply unit, and a power supply unit that supplies high-frequency and low-frequency power to the chamber, and includes: a step of mounting, on the substrate support, the substrate including a lower thin film deposited under the condition of a process temperature in a low temperature range; a step of depositing an upper thin film on the lower thin film under the condition of the process temperature in the low temperature range; and a step of treating a surface of the upper thin film under the condition of the process temperature in the low temperature range.