The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2024

Filed:

Dec. 13, 2018
Applicants:

Micro Focus Llc, Santa Clara, CA (US);

Hai-ying Liu, Shanghai, CN;

Chen Ding, Shanghai, CN;

Jing-chun Xia, Shanghai, CN;

Inventors:

Hai-Ying Liu, Shanghai, CN;

Chen Ding, Shanghai, CN;

Jing-Chun Xia, Shanghai, CN;

Assignee:

Micro Focus LLC, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 11/20 (2006.01); G06Q 10/0631 (2023.01);
U.S. Cl.
CPC ...
G06Q 10/06313 (2013.01); G06T 11/206 (2013.01);
Abstract

A technique includes displaying, by a computer using a graphical interface, a map of a geographical area, where the map includes political boundaries. The technique includes displaying, by the computer, graphical images on the map representing a plurality of aspects that are associated with the management of a plurality of projects as corresponding geographical features on the map. The technique includes graphically segregating, by the computer, the plurality of projects on the map using the political boundaries; receiving input, via interaction with the displayed map; and changing, by the computer, in response to the interaction, how a given aspect of the plurality of aspects of a given project of the plurality of projects is represented on the map.


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