The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2024
Filed:
May. 18, 2021
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Jacob Chamoun, Stanford, CA (US);
Mahati Chintapalli, Mountain View, CA (US);
David K. Biegelsen, Portola Valley, CA (US);
Xerox Corporation, Norwalk, CT (US);
Abstract
A method and system for stress engineering of a transparent material can include an imaging system that can visualize a spatial distribution of an internal stress in a transparent material, an actuator system that can induce stress in the transparent material, the actuator system comprising one or more actuator elements, and a feedback system that can communicate with the imaging system and the actuator system, and which can guide an internal stress distribution in the transparent material toward a preferred final state.