The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2024

Filed:

Nov. 10, 2020
Applicant:

Beijing Didi Infinity Technology and Development Co., Ltd., Beijing, CN;

Inventors:

Xiaoqiang Teng, Beijing, CN;

Rongzhi Wang, Beijing, CN;

Jiankuan Li, Beijing, CN;

Zhiwei Ruan, Beijing, CN;

Zongyue Liu, Beijing, CN;

Jun Zhang, Beijing, CN;

Pengfei Xu, Beijing, CN;

Shenggang Bao, Beijing, CN;

Chao Liu, Beijing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01C 21/12 (2006.01); G01C 21/16 (2006.01); G01C 21/20 (2006.01); G01C 21/36 (2006.01); G06K 9/46 (2006.01);
U.S. Cl.
CPC ...
G01C 21/206 (2013.01); G01C 21/12 (2013.01); G01C 21/1656 (2020.08); G01C 21/3602 (2013.01); G01C 21/3632 (2013.01);
Abstract

The present disclosure is related to systems and methods for indoor positioning. The method includes obtaining a first location of a subject at a first time point. The method also includes determining one or more motion parameters associated with the subject at least based on one or more sensors carried by the subject. The method further includes determining, based on the first location of the subject and the one or more motion parameters associated with the subject, a second location of the subject at a second time point after the first time point. The method still further includes adjusting, at least based on surroundings information associated with the subject at the second time point, the second location of the subject to determine a target location of the subject.


Find Patent Forward Citations

Loading…