The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2024
Filed:
Sep. 02, 2020
Semsysco Gmbh, Salzburg, AT;
Herbert Ötzlinger, Hallwang, AT;
Oliver Knoll, Salzburg, AT;
Raoul Schröder, Neuenstein, DE;
Markus Gersdorff, Salzburg, AT;
Thomas Wirnsberger, Seeboden, AT;
Georg Hofer, Stadl-Predlitz, AT;
Andreas Gleissner, Stadl-Predlitz, AT;
SEMSYSCO GMBH, Salzburg, AT;
Abstract
The invention relates to a substrate holding and locking system for chemical and/or electrolytic surface treatment of a substrate in a process fluid and a corresponding method. The system comprises a first element, a second element, a reduced pressure holding unit and a magnetic locking unit. The first element and the second element are configured to hold the substrate between each other. The reduced pressure holding unit comprises a pump to reduce an interior pressure inside the substrate holding and locking system below atmospheric pressure. The magnetic locking unit is configured to lock the first element and the second element with each other. The magnetic locking unit comprises a magnet control and at least a magnet. The magnet is arranged at one of the first element and the second element. The magnet control is configured to control a magnetic force between the first element and the second element.