The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2024

Filed:

Apr. 12, 2021
Applicant:

Ceeveetech, Llc, Peabody, MA (US);

Inventor:

Egbert G. Woelk, North Andover, MA (US);

Assignee:

CeeVee Tech, LLC, Peabody, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/448 (2006.01); C23C 16/46 (2006.01); C23C 16/52 (2006.01); C23C 18/12 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4481 (2013.01); C23C 16/46 (2013.01); C23C 16/52 (2013.01); C23C 16/448 (2013.01); C23C 18/1283 (2013.01);
Abstract

Techniques for controlling a solid precursor vapor source are provided. An example method disclosure includes providing a carrier gas to a precursor material in a sublimation vessel, such that the sublimation vessel includes an inlet area and an outlet area configured to enable the carrier gas to flow through the precursor material, and at least one thermal device configured to add or remove heat from the sublimation vessel, determining a sublimation temperature value and a delta temperature value based on the precursor material and the carrier gas, setting a first temperature in the sublimation vessel based on the sublimation temperature value and the delta temperature value, such that the first temperature is measured proximate to the inlet area, and setting a second temperature in the sublimation vessel based on the sublimation temperature value, such that the second temperature is measured proximate to the outlet area.


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