The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2024

Filed:

Mar. 03, 2021
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventor:

Keigo Nishida, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01); C23C 16/52 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); C23C 16/345 (2013.01); C23C 16/40 (2013.01); C23C 16/52 (2013.01); H01L 21/0217 (2013.01); H01L 21/02263 (2013.01); H01L 21/67017 (2013.01); H01L 21/67253 (2013.01);
Abstract

There is provided a technique that includes: removing a deposit that adheres to an interior of a process chamber by performing a cycle a predetermined number of times, the cycle including performing sequentially: (a) supplying a cleaning gas to the interior of the process chamber until an internal pressure of the process chamber rises to a first pressure range; (b) exhausting the interior of the process chamber and supplying the cleaning gas to the interior of the process chamber in parallel to maintain the internal pressure of the process chamber within the first pressure range; and (c) exhausting the interior of the process chamber until the internal pressure of the process chamber reaches a second pressure that is below the first pressure range.


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