The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2024
Filed:
Jul. 31, 2019
Applicant:
Merck Patent Gmbh, Darmstadt, DE;
Inventors:
Tadashi Kishimoto, Kanagawa, JP;
Yuko Arai, Kanagawa, JP;
Masayoshi Suzuki, Tokyo, JP;
Daishi Yokoyama, Kakegawa, JP;
Katsuto Taniguchi, Shizuoka, JP;
Assignee:
MERCK PATENT GMBH, Darmstadt, DE;
Primary Examiner:
Int. Cl.
CPC ...
C08F 290/12 (2006.01); C08F 222/10 (2006.01); C09D 4/06 (2006.01); C09D 5/22 (2006.01); C09D 7/40 (2018.01); C09D 7/45 (2018.01); C09D 7/61 (2018.01); C09D 135/02 (2006.01); C09K 11/02 (2006.01); C09K 11/08 (2006.01); C09K 11/56 (2006.01); C09K 11/70 (2006.01); C09K 11/88 (2006.01);
U.S. Cl.
CPC ...
C08F 290/126 (2013.01); C09D 4/06 (2013.01); C09D 5/22 (2013.01); C09D 7/45 (2018.01); C09D 7/61 (2018.01); C09D 7/67 (2018.01); C09D 135/02 (2013.01); C09K 11/02 (2013.01); C09K 11/0883 (2013.01); C09K 11/565 (2013.01); C09K 11/70 (2013.01); C09K 11/883 (2013.01); C08F 222/106 (2020.02);
Abstract
Photosensitive compositions containing nanosized light emitting materials and (meth)acrylic polymer are suitable for use in a variety of optical applications, for example the preparation of quantum material doped photoresist films, especially for optical devices. Optical films can be prepared be by: a) providing the photosensitive composition onto a substrate, and b) polymerizing the photosensitive composition by exposing the photosensitive composition to radiation.