The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2024

Filed:

Nov. 29, 2019
Applicant:

Jsw Aktina System Co., Ltd., Yokohama, JP;

Inventors:

Teruaki Shimoji, Tokyo, JP;

Daisuke Ito, Tokyo, JP;

Tatsuro Matsushima, Tokyo, JP;

Ryo Shimizu, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/08 (2014.01); B23K 26/073 (2006.01); H01L 21/26 (2006.01); H01L 21/268 (2006.01); H01L 21/67 (2006.01); B23K 101/40 (2006.01);
U.S. Cl.
CPC ...
B23K 26/083 (2013.01); B23K 26/0732 (2013.01); H01L 21/268 (2013.01); H01L 21/67115 (2013.01); B23K 2101/40 (2018.08);
Abstract

A laser processing apparatus includes: a stagecapable of levitating and transporting a substrateby jetting gas from a front surface; a laser oscillator configured to irradiate a laser beamonto the substrate; and a gas jetting port arranged at a position overlapping a focus point position of the laser beamin plan view, and being configured to jet inert gas. The front surface of the stageis constituted by upper structuresand, and the upper structuresandare arranged so as to be spaced apart from each other and face each other. A gap between the upper structuresandoverlaps the focus point position of the laser beamin plan view. A filling memberis arranged between the upper structuresandso as to fill the gap between the upper structuresand


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