The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2024
Filed:
Nov. 09, 2018
Wanhua Chemical Group Co., Ltd., Shandong, CN;
Wanhua Chemical (Ningbo) Co., Ltd., Zhejiang, CN;
Xiaoxiao Ji, Shandong, CN;
Haidong Jia, Shandong, CN;
Nuo Xu, Shandong, CN;
Shan Liu, Shandong, CN;
Yunling Liu, Shandong, CN;
Jie Zhang, Shandong, CN;
Xueshun Ji, Shandong, CN;
Jiakuan Sun, Shandong, CN;
WANHUA CHEMICAL GROUP CO., LTD., Shandong, CN;
WANHUA CHEMICAL (NINGBO) CO., LTD., Zhejiang, CN;
Abstract
Disclosed by the present invention are an aqueous polyurethane functional mask substrate and an application thereof. Two kinds of water-based polyurethane dispersions are used as the main components of the mask substrate. The transdermal penetration and absorption of functional ingredients such as whitening, moisturizing and anti-aging ingredients in facial mask products are promoted by means of the special cross-linked structures of polyurethane films. During use, a mask is evenly applied to the face; and after the mask dries, the entire mask may be removed directly or removed after being moistened using water. The mask substrate according to the present invention is also applicable to body masks such as a hand mask, a neck mask and a back mask.