The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2024

Filed:

Jun. 14, 2022
Applicant:

Anhui University, Hefei, CN;

Inventors:

Zhixiang Huang, Hefei, CN;

Junjie Han, Hefei, CN;

Jie Wu, Hefei, CN;

Assignee:

Anhui University, Hefei, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 15/00 (2006.01); H01Q 1/38 (2006.01); H01Q 1/50 (2006.01);
U.S. Cl.
CPC ...
H01Q 15/0086 (2013.01); H01Q 1/38 (2013.01); H01Q 1/50 (2013.01);
Abstract

The present disclosure provides a dual-mode orbital angular momentum (OAM) convergence base cell array and metasurface preparation method. The base cell array includes 2(2−1) anisotropic cell structures and 2isotropic cell structures. Each of the anisotropic cell structures includes a bottom ground layer, a dielectric substrate layer and a top pattern layer which are disposed in sequence from bottom to top, where each top pattern layer has an axisymmetric H-shaped structure. Each of the isotropic cell structures includes a bottom ground layer, a dielectric substrate layer and a top pattern layer which are disposed in sequence from bottom to top, where each top pattern layer has a square structure.


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