The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2024
Filed:
Apr. 13, 2021
Hkc Corporation Limited, Shenzhen, CN;
Chuzhou Hkc Optoelectronics Technology Co., Ltd., Chuzhou, CN;
En-Tsung Cho, Shenzhen, CN;
Fengyun Yang, Shenzhen, CN;
Yuming Xia, Shenzhen, CN;
Je-Hao Hsu, Shenzhen, CN;
Zhen Liu, Shenzhen, CN;
Hejing Zhang, Shenzhen, CN;
Wanfei Yong, Shenzhen, CN;
HKC CORPORATION LIMITED, Shenzhen, CN;
CHUZHOU HKC OPTOELECTRONICS TECHNOLOGY CO., LTD., Chuzhou, CN;
Abstract
Disclosed is a manufacture method of the array substrate, including: sequentially forming a gate, a gate insulating layer, an active layer, an ohmic contact layer and a metal layer on a substrate, forming a photoetching mask on the metal layer, where thickness of the photoetching mask in a half exposure area of the mask plate is from 2000 Å to 6000 Å; etching the metal layer, the ohmic contact layer and the active layer outside a covering area of the photoetching mask; ashing the photoetching mask for a preset time with an ashing reactant, wherein the ashing reactant comprises oxygen, and the preset time is from 70 seconds to 100 seconds; and sequentially etching the metal layer, the ohmic contact layer and the active layer based on the ashed photoetching mask, and forming a channel region of the array substrate. The present disclosure further discloses an array substrate, and a display panel.