The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2024

Filed:

Mar. 01, 2021
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Daisuke Hara, Toyama, JP;

Takashi Yahata, Toyama, JP;

Tsuyoshi Takeda, Toyama, JP;

Kenji Ono, Toyama, JP;

Kazuhiko Yamazaki, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3244 (2013.01); H01J 37/32715 (2013.01); H01J 37/32834 (2013.01); H01J 37/32862 (2013.01); H01L 21/0217 (2013.01); H01L 21/02271 (2013.01); H01L 21/67109 (2013.01); H01L 21/68771 (2013.01); H01J 2237/20214 (2013.01); H01J 2237/332 (2013.01);
Abstract

Described herein is a technique capable of efficiently removing a foreign substance in a reaction tube. According to one aspect of the technique, there is provided a substrate processing apparatus including: a reaction tube in which a substrate is processed; and a substrate retainer including a plurality of support columns configured to support the substrate, wherein at least one among the plurality of the support columns includes: a hollow portion through which an inert gas is supplied; and a gas supply port through which the inert gas is supplied toward an inner wall of the reaction tube.


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