The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2024
Filed:
May. 31, 2021
Applicant:
Linco Technology Co., Ltd., Taichung, TW;
Inventors:
Yi-Yuan Huang, Taichung, TW;
Yi-Cheng Liu, Taichung, TW;
Assignee:
LINCO TECHNOLOGY CO., LTD., Taichung, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01J 1/00 (2006.01); H01J 3/00 (2006.01); H01J 5/00 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32357 (2013.01); H01J 37/32449 (2013.01); H01J 37/32522 (2013.01); H01J 37/32743 (2013.01); H01J 37/32834 (2013.01); H01J 2237/3341 (2013.01);
Abstract
A substrate processing apparatus comprises a chamber member that defines an interior volume that has an aspect ratio. The chamber member comprises a pair of laterally opposing inlet walls and a loading port. Each of the pair of laterally opposing inlet walls has an inlet port configured to receive output from a remote plasma source. The loading port is arranged between the pair of inlet walls, configured to allow passage of a substrate into the interior volume.