The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2024

Filed:

Dec. 08, 2021
Applicant:

Amazon Technologies, Inc., Seattle, WA (US);

Inventors:

Taewan Kim, Seattle, WA (US);

Jesse Norman Clark, Ascot Vale, AU;

Onkar Jayant Dabeer, Sammamish, WA (US);

Assignee:

Amazon Technologies, Inc., Seattle, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06V 10/774 (2022.01); B25J 9/16 (2006.01); G06V 10/75 (2022.01); G06V 10/764 (2022.01); G06V 20/64 (2022.01);
U.S. Cl.
CPC ...
G06V 10/774 (2022.01); B25J 9/163 (2013.01); B25J 9/1697 (2013.01); G06V 10/75 (2022.01); G06V 10/764 (2022.01); G06V 20/64 (2022.01);
Abstract

Techniques for training a machine-learning model are described. In an example, a computer generates a first pseudo-label indicating a first mask associated with a first object detected by a first machine-learning model in a first training image. A transformed image of the first training image can be generated using a transformation. Based on the transformation, a second pseudo-label indicating a second mask detected in the transformed image and corresponding to the first mask can be determined. A second machine-learning model can be trained using the second pseudo-label. The trained, second machine-learning model can detect a third mask associated with a second object based on a second image.


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