The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2024

Filed:

Aug. 10, 2020
Applicant:

Fanuc Corporation, Yamanashi, JP;

Inventor:

Shoutarou Ogura, Yamanashi, JP;

Assignee:

FANUC CORPORATION, Yamanashi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 7/73 (2017.01); G06T 1/00 (2006.01); G06T 7/00 (2017.01); G06V 10/74 (2022.01); G06V 10/75 (2022.01); G06V 20/52 (2022.01);
U.S. Cl.
CPC ...
G06T 7/74 (2017.01); G06T 1/0014 (2013.01); G06T 7/001 (2013.01); G06V 10/757 (2022.01); G06V 10/761 (2022.01); G06V 20/52 (2022.01); G06T 7/73 (2017.01); G06V 10/759 (2022.01);
Abstract

The object detection device extracts a plurality of predetermined features from an image in which a target object is represented, calculates an entire coincidence degree between the plurality of predetermined features set for an entire model pattern of the target object and the plurality of predetermined features extracted from a corresponding region on the image while changing a relative positional relationship between the image and the model pattern, and calculates, for each partial region including a part of the model pattern, a partial coincidence degree between the predetermined features included in the partial region and the predetermined features extracted from a region corresponding to the partial region on the image. Then, the object detection device determines whether or not the target object is represented in the region on the image corresponding to the model pattern based on the entire coincidence degree and the partial coincidence degree.


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