The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2024
Filed:
Jan. 19, 2018
Korea Advanced Institute of Science and Technology, Daejeon, KR;
Jung-Wuk Hong, Daejeon, KR;
Seong Eun Oh, Daejeon, KR;
Sang Eon Lee, Daejeon, KR;
Suyeong Jin, Daejeon, KR;
Abstract
A peridynamic method having an added mirroring node according to embodiments of the present invention includes: a first step of calculating a shape tensor of a first node; a second step of calculating force state vectors of the first node and each of a plurality of second nodes by using the shape tensor; and a third step of calculating a peridynamic motion equation of the first node by using the force state vectors. The first node is a node located on a boundary of a structure and has a predetermined size horizon region, the plurality of second nodes is nodes in the horizon region, the plurality of second nodes includes one or more third nodes, and the third node is a second node having no node at a point which is origin-symmetrical based on the first node among the plurality of second nodes. In the first step, the shape tensor is calculated by using a position value in which the third node is origin-symmetrical based on the first node.