The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2024
Filed:
Aug. 25, 2022
Shandong Xinyuan Photoelectric Technology Co., Ltd, Linyi, CN;
Delong Li, Linyi, CN;
Abstract
A beam shaping method and device employing full-image transfer for planar light sources. The method comprises: using multiple first lenses to respectively magnify and image beams emitted by multiple planar light sources, so as to obtain magnified full images of the multiple planar light sources; and seamlessly stitching together the magnified full images of the multiple planar light sources at a primary imaging position, so as to obtain a seamless light source at the primary imaging position. The beam shaping method for the planar light sources achieves the elimination of gaps between the light sources with almost no loss of optical power by means of full-image transfer and seamless stitching, thereby improving the beam quality of the light sources as a whole. This kind of optical shaping method is suitable for shaping and processing planar light sources such as VCSEL and LED.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile