The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2024

Filed:

Sep. 30, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Eric Kihara Shono, San Mateo, CA (US);

Vishwas Kumar Pandey, Madhya Pradesh, IN;

Christopher S. Olsen, Fremont, CA (US);

Kartik Shah, Saratoga, CA (US);

Hansel Lo, San Jose, CA (US);

Tobin Kaufman-Osborn, Sunnyvale, CA (US);

Rene George, San Carlos, CA (US);

Lara Hawrylchak, Gilroy, CA (US);

Erika Hansen, San Jose, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/40 (2006.01); C23C 16/458 (2006.01); C23C 16/52 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45517 (2013.01); C23C 16/40 (2013.01); C23C 16/45563 (2013.01); C23C 16/45582 (2013.01); C23C 16/45587 (2013.01); C23C 16/45591 (2013.01); C23C 16/4584 (2013.01); C23C 16/52 (2013.01); H01L 21/67017 (2013.01);
Abstract

A gas injector for processing a substrate includes a body having an inlet connectable to a gas source that is configured to provide a gas flow in a first direction into the inlet when processing a substrate on a substrate support disposed within a processing volume of a processing chamber, and an a gas injection channel formed in the body. The gas injection channel is in fluid communication with the inlet and configured to deliver the gas flow to an inlet of the processing chamber. The gas injection channel has a first interior surface and a second interior surface that are parallel to a second direction and a third direction. The second and third directions are misaligned with a center of the substrate, and are at an angle to the first direction towards a first edge of the substrate support.


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