The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2024
Filed:
May. 28, 2019
Applicant:
Repligen Corporation, Waltham, MA (US);
Inventors:
Michael Bransby, Altadena, CA (US);
Derek Carroll, Los Angeles, CA (US);
Philip Yuen, Long Beach, CA (US);
Ralf Kuriyel, Waltham, MA (US);
Assignee:
REPLIGEN CORPORATION, Waltham, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 61/14 (2006.01); B01D 63/02 (2006.01); B01D 63/06 (2006.01); B01D 65/08 (2006.01); C12M 1/26 (2006.01);
U.S. Cl.
CPC ...
B01D 63/06 (2013.01); B01D 61/147 (2013.01); B01D 63/02 (2013.01); B01D 65/08 (2013.01); C12M 33/14 (2013.01); B01D 2315/10 (2013.01); B01D 2321/20 (2013.01);
Abstract
The disclosure provides tangential flow depth filtration (TFDF) systems which exhibit improved filter fluxes and process capacities and reduced fouling characteristics. The TFDF systems of the disclosure optionally utilize tubular depth filters (TDF). Methods are provided which include the passage of a non-laminar flow through at least a portion of a length of a TDF in a TFDF system.