The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2024
Filed:
Feb. 29, 2020
Jiangsu Leuven Instruments Co. Ltd, Jiangsu, CN;
Na Li, Jiangsu, CN;
Dongdong Hu, Jiangsu, CN;
Xiaobo Liu, Jiangsu, CN;
Haiyang Liu, Jiangsu, CN;
Shiran Cheng, Jiangsu, CN;
Song Guo, Jiangsu, CN;
Zhihao Wu, Jiangsu, CN;
Kaidong Xu, Jiangsu, CN;
JIANGSU LEUVEN INSTRUMENTS CO. LTD, Jiangsu, CN;
Abstract
The present invention provides a device for blocking plasma backflow in a process chamber to protect an air inlet structure, comprising an air inlet nozzle tightly connected to an air inlet flange. The inner cavity of the air inlet nozzle is provided with an air inlet guide body, wherein the air inlet guide body has an upper structure, a middle structure, and a lower structure, the upper, middle, and lower structures are an integrated structure, the upper, middle, and lower structures are all cylindrical, the cross-sectional diameter of the upper structure is smaller than that of the middle structure, a gas gathering area is arranged between the middle structure and the lower structure, and the middle structure and the lower structure are connected by the gas gathering area.