The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2024

Filed:

Mar. 15, 2023
Applicant:

Raven Industries, Inc., Sioux Falls, SD (US);

Inventors:

Yuri Sneyders, Zemst, BE;

John D. Preheim, Beresford, SD (US);

Assignee:

Raven Industries, Inc., Sioux Falls, SD (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/536 (2017.01); A01C 14/00 (2006.01); G06T 7/66 (2017.01); G06T 7/90 (2017.01); A01B 69/00 (2006.01); A01D 75/00 (2006.01);
U.S. Cl.
CPC ...
G06T 7/536 (2017.01); A01C 14/00 (2013.01); G06T 7/66 (2017.01); G06T 7/90 (2017.01); A01B 69/001 (2013.01); A01D 75/00 (2013.01); G06T 2207/30188 (2013.01);
Abstract

A device to determine a height disparity between features of an image includes a memory including instructions and processing circuitry. The processing circuitry is configured by the instructions to obtain an image including a first repetitive feature and a second repetitive feature. The processing circuitry is further configured by the instructions to determine a distribution of pixels in a first area of the image, where the first area includes an occurrence of the repetitive features, and to determine a distribution of pixels in a second area of the image, where the second area includes another occurrence of the repetitive features. The processing circuitry is further configured by the instructions to evaluate the distribution of pixels in the first area and the distribution of pixels in the second area to determine a height difference between the first repetitive feature and the second repetitive feature.


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