The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2024

Filed:

Jul. 31, 2020
Applicant:

GE Precision Healthcare Llc, Milwaukee, WI (US);

Inventors:

Junpyo Hong, San Ramon, CA (US);

Venkata Ratnam Saripalli, Danville, CA (US);

Gopal B. Avinash, San Ramon, CA (US);

Karley Marty Yoder, Oakland, CA (US);

Keith Bigelow, Berkeley, CA (US);

Assignee:

GE PRECISION HEALTHCARE LLC, Waukesha, WI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 5/04 (2023.01); G06N 20/00 (2019.01);
U.S. Cl.
CPC ...
G06N 5/04 (2013.01); G06N 20/00 (2019.01);
Abstract

Techniques are described for performing active surveillance and learning for machine learning (ML) model authoring and deployment workflows. In an embodiment, a method comprises applying, by a system comprising a processor, a primary ML model trained on a training dataset to data samples excluded from the training dataset to generate inferences based on the data samples. The method further comprises employing, by the system, one or more active surveillance techniques to regulate performance of the primary ML model in association with the applying, wherein the one or more active surveillance techniques comprise at least one of, performing a model scope evaluation of the primary ML model relative to the data samples or using a domain adapted version of the primary ML model to generate the inferences.


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