The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2024
Filed:
May. 25, 2021
Applicants:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Tohoku University, Sendai, JP;
Inventors:
Masao Ando, Joetsu, JP;
Hiroyuki Yamazaki, Joetsu, JP;
Masaki Takeuchi, Joetsu, JP;
Masaru Nakagawa, Sendai, JP;
Shunya Ito, Sendai, JP;
Assignees:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
TOHOKU UNIVERSITY, Sendai, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 19/06 (2006.01); B82Y 35/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G06K 19/06084 (2013.01); B82Y 35/00 (2013.01); B82Y 40/00 (2013.01);
Abstract
Provided is a structure for individual authentication in which a pillar pattern region including a plurality of nanopillars formed of synthetic quartz glass is formed on at least a part of a surface portion of a synthetic quartz glass substrate. In the pillar pattern region, the nanopillars have an indentation elastic modulus of 35 to 100 GPa as measured by a nanoindentation method, and the nanopillars are plastically deformed.