The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2024

Filed:

Aug. 26, 2020
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Shoichi Nakamura, Shizuoka, JP;

Takahiro Okawara, Shizuoka, JP;

Yuki Nara, Shizuoka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/031 (2006.01); C08K 5/00 (2006.01); C08K 5/3475 (2006.01); C08L 33/14 (2006.01); G03F 7/00 (2006.01); G03F 7/008 (2006.01);
U.S. Cl.
CPC ...
G03F 7/031 (2013.01); C08K 5/0041 (2013.01); C08K 5/3475 (2013.01); C08L 33/14 (2013.01); G03F 7/0007 (2013.01); G03F 7/0085 (2013.01); G03F 7/70041 (2013.01); C08L 2203/16 (2013.01);
Abstract

Provided are a photosensitive composition for pulse exposure including: a coloring material A; a photoradical polymerization initiator B; and a radically polymerizable compound C, in which a content of a radically polymerizable compound C1 having a weight-average molecular weight of 3000 or higher is 70 mass % or higher with respect to a total mass of the radically polymerizable compound C.


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