The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2024
Filed:
Aug. 05, 2022
Applicant:
Raytheon Technologies Corporation, Farmington, CT (US);
Inventors:
David J. Wasserman, Hamden, CT (US);
Raymond Surace, Newington, CT (US);
Assignee:
RTX CORPORATION, Farmington, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F01D 25/00 (2006.01); F01D 9/04 (2006.01);
U.S. Cl.
CPC ...
F01D 9/042 (2013.01); F01D 25/005 (2013.01); F05D 2220/32 (2013.01); F05D 2230/60 (2013.01); F05D 2240/12 (2013.01);
Abstract
A vane multiplet includes first and second ceramic matrix composite (CMC) singlet vanes that are arranged circumferentially adjacent each other. Each of the CMC singlet vanes includes an airfoil section and a platform at one end of the airfoil section. The platform defines forward and trailing platform edges and first and second circumferential side edges. A CMC overwrap conjoins the CMC singlet vanes. The CMC overwrap includes fiber plies that are fused to the platforms of the CMC singlet vanes.