The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2024

Filed:

Feb. 19, 2020
Applicant:

American Boronite Corporation, Burlington, MA (US);

Inventors:

David S. Lashmore, Lebanon, NH (US);

Pavel Bystricky, Lexington, MA (US);

Susanthri Chandima Perera, Cohoes, NY (US);

Imre Tary, Leominster, MA (US);

Vito M. Licata, Saugus, MA (US);

Assignee:

American Boronite Corporation, Burlington, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B32B 9/00 (2006.01); C01B 32/162 (2017.01); C01B 32/168 (2017.01); D01F 9/12 (2006.01); D01F 13/00 (2006.01); H05K 9/00 (2006.01);
U.S. Cl.
CPC ...
C01B 32/162 (2017.08); C01B 32/168 (2017.08); D01F 9/12 (2013.01); D01F 13/00 (2013.01); H05K 9/009 (2013.01); C01B 2202/22 (2013.01); C01B 2202/26 (2013.01); C01B 2202/36 (2013.01); C01P 2002/82 (2013.01); Y10T 428/30 (2015.01);
Abstract

The present disclosure provides systems and methods for producing a volume of substantially all armchair nanotubes of a preselected chirality for fabricating yarn consisting of substantially all metallic conducting armchair tubes. The systems and methods can be used for the synthesis of (10,10), (11,11), and (12,12) metallic armchair carbon nanotubes and potentially other chiralities. The elements of the present disclosure include: (i) a carbon source that provides substantial numbers of ethylene and acetylene radicals in combination with a high population of ethylene groups and a small amount of methane, (ii) a hydrogen to carbon ratio sufficient to 'passivate' all other chiral growth sites to a higher degree than armchair growth sites, and (iii) a CVD process that can be tuned to create a well-controlled population of catalyst with tight diameter distribution with sparse modal distribution that falls within a range of the desired single wall diameters.


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