The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2024
Filed:
Jun. 15, 2018
Applicant:
Wisconsin Alumni Research Foundation, Madison, WI (US);
Inventors:
Chao Li, Madison, WI (US);
Jiaquan Yu, Madison, WI (US);
Theodorus Evan de Groot, Madison, WI (US);
David James Beebe, Monona, WI (US);
Assignee:
Wisconsin Alumni Research Foundation, Madison, WI (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01L 3/00 (2006.01); B05D 1/00 (2006.01); B05D 5/08 (2006.01);
U.S. Cl.
CPC ...
B01L 3/502 (2013.01); B05D 1/60 (2013.01); B05D 5/08 (2013.01); B01L 2300/166 (2013.01);
Abstract
Systems, methods, compositions of matter, and kits for undermedia repellency are disclosed. In some cases, these involve a first volume of a first liquid presented in a second volume of a second liquid above a first location of a first surface. The first liquid, second liquid, and first location can have properties sufficient to give rise to undermedia perfect liquid repellency.