The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2024

Filed:

Jan. 20, 2022
Applicant:

Carl Zeiss Meditec Ag, Jena, DE;

Inventors:

Michael Bergt, Weimar, DE;

Thomas Hamann, Jena, DE;

Robert Pomraenke, Jena, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61F 9/00 (2006.01); A61F 9/008 (2006.01);
U.S. Cl.
CPC ...
A61F 9/00834 (2013.01); A61F 9/00817 (2013.01); A61F 9/00821 (2013.01); A61F 9/00825 (2013.01); A61F 2009/00846 (2013.01); A61F 2009/0087 (2013.01); A61F 2009/00872 (2013.01); A61F 2009/00874 (2013.01); A61F 2009/00897 (2013.01);
Abstract

A system for processing a portion in a processing volume of a transparent material by application of focused radiation including a device for generating and an optical system for focusing radiation, with a device for changing the position of the focus of the radiation and a control device. The system includes a controller that controls the ophthalmologic therapy system. The controller is encoded with a scan pattern. The scan pattern includes adjacent strokes with each adjacent stroke having an angle of inclination (α) to the beam axis; and the angle of inclination (α) of the strokes to the beam axis is always larger than or equal to the focal angle (φ) of the focused radiation.


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