The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2024

Filed:

Dec. 06, 2018
Applicant:

Graphensic Ab, Stockholm, SE;

Inventors:

Samuel Lara-Avila, Gothenburg, SE;

Sergey Kubatkin, Gothenburg, SE;

Hans He, Gothenburg, SE;

Assignee:

GRAPHENSIC AB, Stockholm, SE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 43/04 (2006.01); C01B 32/194 (2017.01); G01R 33/07 (2006.01); H10N 52/01 (2023.01); H10N 52/80 (2023.01); B82Y 15/00 (2011.01); B82Y 40/00 (2011.01); H10N 52/00 (2023.01);
U.S. Cl.
CPC ...
H10N 52/80 (2023.02); C01B 32/194 (2017.08); G01R 33/07 (2013.01); H10N 52/01 (2023.02); B82Y 15/00 (2013.01); B82Y 40/00 (2013.01); C01B 2204/22 (2013.01); H10N 52/101 (2023.02);
Abstract

The present invention relates to a method for connecting an electrical contact to a nanomaterial carried by a substrate. At least one layer of soluble lithography resist is provided on the nanomaterial. An opening in the at least one layer of resist exposes a surface portion of the nanomaterial. At least a portion of the exposed surface portion of the nanomaterial is removed to thereby expose the underlying substrate and an edge of the nanomaterial. A metal is deposited on at least the edge of the nanomaterial and the exposed substrate such that the metal forms an electrical contact with the nanomaterial. Removing at least a portion of the soluble lithography resist from the nanomaterial such that at least a portion of the two-dimensional material is exposed.


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