The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2024

Filed:

Oct. 13, 2020
Applicant:

Meta Platforms Technologies, Llc, Menlo Park, CA (US);

Inventors:

Nadav Grossinger, Foster City, CA (US);

Michael Hall, Bellevue, WA (US);

Robert Hasbun, San Jose, CA (US);

Jonatan Ginzburg, Sunnyvale, CA (US);

Zihe Gao, Redmond, WA (US);

Assignee:

META PLATFORMS TECHNOLOGIES, LLC, Menlo Park, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 5/42 (2006.01); G01S 17/89 (2020.01); G02B 27/01 (2006.01); G06T 7/521 (2017.01); H04N 13/271 (2018.01);
U.S. Cl.
CPC ...
H01S 5/423 (2013.01); G01S 17/89 (2013.01); G02B 27/0172 (2013.01); G06T 7/521 (2017.01); H04N 13/271 (2018.05);
Abstract

A depth camera assembly (DCA) determines depth information for a local area. The DCA includes a camera assembly and at least one illuminator. The DCA may select a subset of the VCSELs to provide illumination at any given time. The illuminator may comprise near-field VCSELs configured to generate a structured light (SL) pattern for depth sensing in the near-field and far-field VCSELs configured to generate a SL pattern for depth sensing in the far-field. The near-field VCSELs may comprise a linear emission region which is shorter than a linear emission region of the far-field VCSELs. The DCA may generate and phase shift a quasi-sinusoidal SL pattern. The DCA may phase shift the quasi-sinusoidal SL pattern by alternating which traces on the illuminator are active.


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