The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2024

Filed:

Jun. 10, 2020
Applicant:

Dh Technologies Development Pte. Ltd., Singapore, SG;

Inventors:

Robert E. Haufler, Toronto, CA;

William M. Loyd, Sugar Land, TX (US);

Takashi Baba, Richmond Hill, CA;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/40 (2006.01); H01J 49/00 (2006.01);
U.S. Cl.
CPC ...
H01J 49/40 (2013.01); H01J 49/0031 (2013.01); H01J 49/0036 (2013.01);
Abstract

A calibration apparatus for a mass analyzer includes an ion source device and a dual-purpose electron beam generating unit. The ion source device ionizes an analyte of a sample, producing analyte ions. The dual-purpose electron beam generating unit is positioned between the ion source device and the mass analyzer. In a first mode, the dual-purpose electron beam generating unit is used to create fragments of analyte ions of unknown mass-to-charge ratio. In a second mode, the dual-purpose electron beam generating unit is used to create ions of calibration compounds of known mass-to-charge ratio. All ions are subsequently transferred to the mass analyzer.


Find Patent Forward Citations

Loading…