The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2024

Filed:

May. 24, 2022
Applicant:

Elbit Systems of America, Llc, Fort Worth, TX (US);

Inventors:

Stephen Carroll, Salem, VA (US);

William J. Baney, Roanoke, VA (US);

Cooper Gray Temple, Christiansburg, VA (US);

Matthew Robert Curtis, Blue Ridge, VA (US);

Assignee:

Elbit Systems of America, LLC, Fort Worth, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 43/28 (2006.01); C03C 15/00 (2006.01); C23C 14/04 (2006.01); C23C 14/14 (2006.01); C23C 14/22 (2006.01); C23C 14/24 (2006.01); C23C 14/50 (2006.01); G02B 23/12 (2006.01); H01J 43/02 (2006.01); H01J 43/12 (2006.01);
U.S. Cl.
CPC ...
H01J 43/28 (2013.01); C03C 15/00 (2013.01); C23C 14/042 (2013.01); C23C 14/14 (2013.01); C23C 14/225 (2013.01); C23C 14/24 (2013.01); C23C 14/505 (2013.01); H01J 43/02 (2013.01); H01J 43/12 (2013.01);
Abstract

A night vision system, a microchannel plate (MCP), and a planetary deposition system and methodology are provided for selectively depositing an electrode contact metal on one side of MCP channel openings. One or more MCPs can be releasably secured to a face of a platter that rotates about its central platter axis. The rotating platter can be tilted on a rotating ring fixture surrounding an evaporative source of contact metal. Therefore, the rotating platter further rotates so that it orbits around the evaporative source of contact metal. A mask with a variable size mask opening is arranged between the rotating platter and the evaporative source. While the mask orbits around the evaporative source with the rotating platter, the mask does not rotate along its own axis as does the rotating platter.


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