The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2024
Filed:
Nov. 15, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Hari Ponnekanti, San Jose, CA (US);
Mukund Srinivasan, Fremont, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/458 (2006.01); C23C 16/505 (2006.01); C23C 16/509 (2006.01); C23C 16/511 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32935 (2013.01); C23C 16/4584 (2013.01); C23C 16/505 (2013.01); C23C 16/509 (2013.01); C23C 16/511 (2013.01); C23C 16/52 (2013.01); H01J 37/32449 (2013.01); H01J 37/32715 (2013.01); H01J 2237/202 (2013.01); H01J 2237/20214 (2013.01); H01J 2237/3321 (2013.01);
Abstract
Apparatus and methods to process a substrate comprising a gas distribution assembly comprising a plasma process region with an array of individual plasma sources. A controller is connected to the array of individual plasma sources and the substrate support. The controller is configured monitor the position of the at least one substrate and provide or disable power to the individual plasma sources based on the position of the substrate relative to the individual plasma sources.