The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2024
Filed:
Jul. 18, 2019
Mitsubishi Heavy Industries, Ltd., Tokyo, JP;
MITSUBISHI HEAVY INDUSTRIES, LTD., Tokyo, JP;
Abstract
A gasification gas treatment facility for treating a gasification gas obtained by gasification of a fuel includes: a first heat exchanger for performing heat exchange between a purified gas obtained by removing at least ammonia and hydrogen chloride from the gasification gas and steam at a saturation temperature; a second heat exchanger for performing heat exchange between the gasification gas and at least condensed water produced by the heat exchange in the first heat exchanger to produce the steam at the saturation temperature; and a circulation system for circulating a circulating fluid including at least one of the steam or the condensed water between the first heat exchanger and the second heat exchanger. The circulation system is configured to supply the circulating fluid including at least the condensed water at the saturation temperature produced in the first heat exchanger to the second heat exchanger.