The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2024

Filed:

Nov. 02, 2018
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

Justin Mamrak, Loveland, OH (US);

Michael Thomas Gansler, Mason, OH (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/153 (2017.01); B22F 10/28 (2021.01); B22F 10/36 (2021.01); B22F 10/366 (2021.01); B22F 12/37 (2021.01); B22F 12/52 (2021.01); B22F 12/67 (2021.01); B22F 12/70 (2021.01); B29C 64/268 (2017.01); B33Y 10/00 (2015.01);
U.S. Cl.
CPC ...
B29C 64/153 (2017.08); B22F 10/28 (2021.01); B22F 10/366 (2021.01); B29C 64/268 (2017.08); B33Y 10/00 (2014.12); B22F 10/36 (2021.01); B22F 12/37 (2021.01); B22F 12/52 (2021.01); B22F 12/67 (2021.01); B22F 12/70 (2021.01);
Abstract

A method, apparatus, and program for additive manufacturing. In one aspect, the method comprises: forming an at least partially solidified portion within a first scan region (), wherein the solidified portion within the first scan region () is formed by irradiating a build material along a first irradiation path (). A second portion of a build material may be irradiated along a second irradiation path (), wherein the second scan region () is offset with respect to the first scan region () thereby defining an offset region (). The offset region () is at least partially solidified by the first irradiation path () and the second irradiation path () and a reference line () intersects the first irradiation path () and the second irradiation path () within the offset region (), wherein the reference line () is substantially parallel to a side () of the first scan region ().


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