The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2024

Filed:

Mar. 18, 2020
Applicant:

Korea Institute of Science and Technology, Seoul, KR;

Inventors:

Byung Chul Lee, Seoul, KR;

Dong-Hyun Kang, Seoul, KR;

Jin soo Park, Seoul, KR;

Tae Song Kim, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B06B 1/02 (2006.01); B81B 3/00 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
B06B 1/0292 (2013.01); B81B 3/0086 (2013.01); B81C 1/00698 (2013.01); B81B 2201/0271 (2013.01); B81B 2203/0127 (2013.01); B81B 2207/07 (2013.01); B81C 2201/0171 (2013.01); B81C 2201/0178 (2013.01); B81C 2201/0194 (2013.01);
Abstract

A method of fabricating a capacitive micromachined ultrasonic transducer (CMUT) according to one aspect of the present invention may include forming, on a semiconductor substrate, a first region implanted with impurity ions at a first average concentration and a second region implanted with no impurity ions or implanted with the impurity ions at a second average concentration lower than the first average concentration, forming an insulating layer by oxidizing the semiconductor substrate wherein the insulating layer includes a first oxide layer having a first thickness on at least a part of the first region and a second oxide layer having a second thickness smaller than the first thickness on at least a part of the second region, and forming a membrane layer on the insulating layer such that a gap is defined between the second oxide layer and the membrane layer.


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